Invention Grant
- Patent Title: Flow controller
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Application No.: US16099234Application Date: 2016-06-30
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Publication No.: US10753914B2Publication Date: 2020-08-25
- Inventor: Kiyonori Koga , Yuki Komori
- Applicant: Shimadzu Corporation
- Applicant Address: JP Kyoto
- Assignee: Shimadzu Corporation
- Current Assignee: Shimadzu Corporation
- Current Assignee Address: JP Kyoto
- Agency: Maier & Maier, PLLC
- International Application: PCT/JP2016/069367 WO 20160630
- International Announcement: WO2018/003046 WO 20180104
- Main IPC: G01N30/32
- IPC: G01N30/32 ; G01N30/46 ; G01N30/04 ; G01N30/02

Abstract:
A flow controller includes a channel assembly, a pressure sensor, and a pressure control valve. The channel assembly includes a laminated substrate comprised of a plurality of substrates laminated, the laminated substrate having a surface on which a gas inlet and a gas outlet are formed, and having, inside the laminated substrate, a plurality of resistance channels not communicating with one another inside the laminated substrate as internal channels. In the flow controller, the gas inlet and the gas outlet communicate to each other to form a flow rate control channel. The pressure sensor and the pressure control valve are provided on the flow rate control channel. At least one of the resistance channels which is selected to have a desired channel resistance of the flow rate control channel is connected to the flow rate control channel as part of the flow rate control channel.
Public/Granted literature
- US20190212308A1 FLOW CONTROLLER Public/Granted day:2019-07-11
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