- Patent Title: Cleaning process optimization device and machine learning device
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Application No.: US15921359Application Date: 2018-03-14
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Publication No.: US10754312B2Publication Date: 2020-08-25
- Inventor: Chikara Tango , Masahiro Murota
- Applicant: FANUC CORPORATION
- Applicant Address: JP Yamanashi
- Assignee: FANUC CORPORATION
- Current Assignee: FANUC CORPORATION
- Current Assignee Address: JP Yamanashi
- Agency: Hauptman Ham, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@d17fb90
- Main IPC: G05B15/02
- IPC: G05B15/02 ; B08B3/02 ; G06N20/00 ; B08B13/00 ; G05B13/02 ; G05B19/406 ; G06N3/08

Abstract:
A cleaning process optimization device includes a machine learning device that learns a cleaning condition when cleaning an object to be cleaned. The machine learning device includes: a state observation unit that observes cleaning condition data indicating the cleaning condition, and contamination state data indicating a contamination state of the object to be cleaned measured before cleaning as a state variable representing a current state of environment; a determination data acquisition unit that acquires determination data indicating an adequacy determination result on accuracy of a contamination state of the object to be cleaned after cleaning; and a learning unit that learns the cleaning condition when cleaning the object to be cleaned in association with the contamination state data using the state variable and the determination data.
Public/Granted literature
- US20180267489A1 CLEANING PROCESS OPTIMIZATION DEVICE AND MACHINE LEARNING DEVICE Public/Granted day:2018-09-20
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