- Patent Title: Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
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Application No.: US15532845Application Date: 2014-12-05
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Publication No.: US10755901B2Publication Date: 2020-08-25
- Inventor: John Chambers , Peter Maschwitz , Yuping Lin , Herb Johnson
- Applicant: AGC FLAT GLASS NORTH AMERICA, INC. , AGC Glass Europe , ASAHI GLASS CO., LTD.
- Applicant Address: US GA Alpharetta BE Louvain-la Neuve JP Tokyo
- Assignee: AGC FLAT GLASS NORTH AMERICA, INC.,AGC GLASS EUROPE,ASAHI GLASS CO., LTD.
- Current Assignee: AGC FLAT GLASS NORTH AMERICA, INC.,AGC GLASS EUROPE,ASAHI GLASS CO., LTD.
- Current Assignee Address: US GA Alpharetta BE Louvain-la Neuve JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- International Application: PCT/US2014/068919 WO 20141205
- International Announcement: WO2016/089427 WO 20160609
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/00 ; H01J37/32 ; H05H1/48 ; C23C16/50
Abstract:
The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.
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