Invention Grant
- Patent Title: FinFET with heterojunction and improved channel control
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Application No.: US16145049Application Date: 2018-09-27
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Publication No.: US10756212B2Publication Date: 2020-08-25
- Inventor: Victor Moroz , Stephen Smith , Qiang Lu
- Applicant: Synopsys, Inc.
- Applicant Address: US CA Mountain View
- Assignee: SYNOPSYS, INC.
- Current Assignee: SYNOPSYS, INC.
- Current Assignee Address: US CA Mountain View
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L29/10 ; H01L27/02 ; H01L27/092

Abstract:
Roughly described, a computer program product describes a transistor with a fin, a fin support, a gate, and a gate dielectric. The fin includes a first crystalline semiconductor material which includes a channel region of the transistor between a source region of the first transistor and a drain region of the transistor. The fin is on a fin support. The fin support includes a second crystalline semiconductor material different from the first crystalline semiconductor material. The first crystalline semiconductor material of the fin and the second crystalline semiconductor material of the fin support form a first heterojunction in between. A gate, gate dielectric, and/or isolation dielectric can be positioned to improve control within the channel.
Public/Granted literature
- US20190043987A1 Finfet with Heterojunction and Improved Channel Control Public/Granted day:2019-02-07
Information query
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