Invention Grant
- Patent Title: Mold surface treatment method and mold treated with said method
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Application No.: US15750661Application Date: 2015-08-11
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Publication No.: US10758968B2Publication Date: 2020-09-01
- Inventor: Keiji Mase , Shozo Ishibashi , Yusuke Kondo
- Applicant: FUJI MANUFACTURING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: FUJI MANUFACTURING CO., LTD.
- Current Assignee: FUJI MANUFACTURING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Cooper Legal Group, LLC
- Agent Ronald M. Kachmarik
- International Application: PCT/JP2015/072793 WO 20150811
- International Announcement: WO2017/026056 WO 20170216
- Main IPC: B22C9/06
- IPC: B22C9/06 ; B22C9/18 ; B22D17/22 ; B24C1/00 ; B29C33/38

Abstract:
A method of treating a surface of a mold. The method includes forming dimples on a surface of a mold by ejecting substantially spherical ejection-particles so as to bombard the surface of the mold. The dimples are formed so as to satisfy a condition defined by the following formula: 1+3.3e−H/230≤W≤3+13.4e−H/1060 wherein W is an equivalent diameter (μm) of the dimples and H is a base metal hardness (Hv) of the mold.
Public/Granted literature
- US20180229293A1 MOLD SURFACE TREATMENT METHOD AND MOLD TREATED WITH SAID METHOD Public/Granted day:2018-08-16
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