Invention Grant
- Patent Title: Method for producing C2-C20 fluorine-containing organic acid, and composition comprising C2-C20 fluorine-containing organic acid
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Application No.: US16309497Application Date: 2017-06-09
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Publication No.: US10759731B2Publication Date: 2020-09-01
- Inventor: Shuuji Itatani , Mihoko Ohashi
- Applicant: DAIKIN INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Sughrue Mion, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@589b23bc
- International Application: PCT/JP2017/021478 WO 20170609
- International Announcement: WO2017/217333 WO 20171221
- Main IPC: C07C53/21
- IPC: C07C53/21 ; C07C51/363 ; C07C51/44 ; C07C303/22 ; C07C303/44 ; C07C303/06 ; C07C309/06

Abstract:
There is provided a method for producing a C2-C20 fluorine-containing organic acid with reduced fluorine-free organic compound. A method for producing a C2-C20 fluorine-containing organic acid, the method including contacting a mixture containing a C2-C20 fluorine-containing organic acid and a fluorine-free organic compound with a concentrated sulfuric acid and then separating a C2-C20 fluorine-containing organic acid phase from a concentrated sulfuric acid phase. The contacting is conducted such that an amount of water present in the concentrated sulfuric acid phase is 10% by mass or less, and the C2-C20 fluorine-containing organic acid is obtained in the form of the C2-C20 fluorinated organic acid phase having a reduced content ratio of the fluorine-free organic compound compared with said mixture.
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