Invention Grant
- Patent Title: High-silicon steel sheet and method of manufacturing the same
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Application No.: US15758826Application Date: 2016-09-08
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Publication No.: US10760143B2Publication Date: 2020-09-01
- Inventor: Tomoyuki Okubo , Tatsuhiko Hiratani , Yoshihiko Oda , Hiroaki Nakajima
- Applicant: JFE Steel Corporation
- Applicant Address: JP Tokyo
- Assignee: JFE Steel Corporation
- Current Assignee: JFE Steel Corporation
- Current Assignee Address: JP Tokyo
- Agency: DLA Piper LLP (US)
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@b281e58
- International Application: PCT/JP2016/004091 WO 20160908
- International Announcement: WO2017/047049 WO 20170323
- Main IPC: C21D9/46
- IPC: C21D9/46 ; C22C38/06 ; C22C38/02 ; C22C38/04 ; B21B3/02 ; C22C38/00 ; C21D8/12 ; C23C10/08 ; B21B1/22 ; C21D6/00 ; C22C38/60

Abstract:
A high-silicon steel sheet is excellent in terms of punching workability and magnetic property. The high-silicon steel sheet has a chemical composition containing, by mass %, C: 0.02% or less, P: 0.02% or less, Si: 4.5% or more and 7.0% or less, Mn: 0.01% or more and 1.0% or less, Al: 1.0% or less, O: 0.01% or less, N: 0.01% or less, and the balance being Fe and inevitable impurities, a grain-boundary oxygen concentration (oxygen concentration with respect to chemical elements segregated at grain boundaries) of 30 at % or less, and a microstructure in which a degree of integration P(211) of a {211}-plane of α-Fe on a surface of the steel sheet is 15% or more P(211)=p(211)/S×100(%), wherein S=p(110)/100+p(200)/14.93+p(211)/25.88+p(310)/7.68+p(222)/1.59+p(321)/6.27+p(411)/1.55, and p(hkl): integrated intensity of a peak of X-ray diffraction of an {hkl}-plane.
Public/Granted literature
- US20180340239A1 HIGH-SILICON STEEL SHEET AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-11-29
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