Invention Grant
- Patent Title: Polycrystalline silicon ingot, polycrystalline silicon bar, and method for producing single crystal silicon
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Application No.: US15785895Application Date: 2017-10-17
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Publication No.: US10760180B2Publication Date: 2020-09-01
- Inventor: Shuichi Miyao , Shigeyoshi Netsu , Naruhiro Hoshino , Tetsuro Okada
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@546ded9f
- Main IPC: C30B29/06
- IPC: C30B29/06 ; C30B13/34 ; C01B33/035

Abstract:
A polycrystalline silicon ingot having a value of Te−Ts, ΔT, of 50° C. or less, wherein Ts and Te are the onset temperature and the completion temperature of melting, respectively, when the temperature is increased at a rate of 60° C./minute or less in the temperature range of 1400° C. or more is used as the production raw material for single crystal silicon. The present invention provides a polycrystalline silicon ingot or polycrystalline silicon rod suitable for stably producing single crystal silicon.
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