Polycrystalline silicon ingot, polycrystalline silicon bar, and method for producing single crystal silicon
Abstract:
A polycrystalline silicon ingot having a value of Te−Ts, ΔT, of 50° C. or less, wherein Ts and Te are the onset temperature and the completion temperature of melting, respectively, when the temperature is increased at a rate of 60° C./minute or less in the temperature range of 1400° C. or more is used as the production raw material for single crystal silicon. The present invention provides a polycrystalline silicon ingot or polycrystalline silicon rod suitable for stably producing single crystal silicon.
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