Invention Grant
- Patent Title: Substrate drying method and substrate processing apparatus
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Application No.: US16047633Application Date: 2018-07-27
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Publication No.: US10760852B2Publication Date: 2020-09-01
- Inventor: Manabu Okutani , Noriyuki Kikumoto , Naohiko Yoshihara , Hiroshi Abe
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4142ebfb
- Main IPC: H01L21/67
- IPC: H01L21/67 ; F26B5/10 ; B08B3/08 ; H01L21/02
Abstract:
A substrate drying method for drying a front surface of a substrate having a pattern includes a sublimation-agent-liquid-film placing step of placing a liquid film of a liquid sublimation-agent on the front surface of the substrate, a high vapor-pressure liquid placing step of placing a liquid film of a high vapor-pressure liquid that has vapor pressure higher than the sublimation agent and that does not include water on the liquid film of the sublimation-agent placed on the front surface of the substrate, a vaporizing/cooling step of losing vaporization heat in response to vaporization of the high vapor-pressure liquid, and, cooling the sublimation-agent, and, as a result, solidifying the liquid film of the sublimation-agent, and, forming a sublimation-agent film on the front surface of the substrate, and a sublimating step of sublimating the sublimation-agent film.
Public/Granted literature
- US20190063834A1 SUBSTRATE DRYING METHOD AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2019-02-28
Information query
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