Invention Grant
- Patent Title: Environmental sensor and manufacturing method thereof
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Application No.: US15781352Application Date: 2015-12-14
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Publication No.: US10760929B2Publication Date: 2020-09-01
- Inventor: Junkai Zhan , Mengjin Cai
- Applicant: Weifang Goertek Microelectronics Co., Ltd.
- Applicant Address: CN Weifang, Shandong Province
- Assignee: Weifang Goertek Microelectronics Co., Ltd.
- Current Assignee: Weifang Goertek Microelectronics Co., Ltd.
- Current Assignee Address: CN Weifang, Shandong Province
- Agency: Alston & Bird LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@43315b0a
- International Application: PCT/CN2015/097317 WO 20151214
- International Announcement: WO2017/092075 WO 20170608
- Main IPC: G01D5/241
- IPC: G01D5/241 ; G01K7/34 ; G01L9/00 ; B81C1/00

Abstract:
An environmental sensor and manufacturing method thereof. The environmental sensor comprises: a substrate comprising at least one recess disposed at an upper portion of the substrate; and a sensitive film layer disposed above the substrate, comprising a fixed portion fixed on an end surface of the substrate and a bent portion configured to extend inside the recess. The bent portion and a side wall of the recess form a capacitor configured to detect a signal. The bent portion, fixed portion, and the recess form a closed cavity. A conventional capacitive structure configured on a substrate surface is changed to a capacitive structure of the environmental sensor vertically extending into the inside of the substrate, increasing a depth of the recess, and in turn, increasing a sensing area between two polar plates of the capacitor, significantly shrinking a coverage area of the capacitor on the substrate, and satisfying a requirement of a modern compact electronic component.
Public/Granted literature
- US20180356255A1 ENVIRONMENTAL SENSOR AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-12-13
Information query
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