Invention Grant
- Patent Title: Pressure detecting device
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Application No.: US16108555Application Date: 2018-08-22
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Publication No.: US10760982B2Publication Date: 2020-09-01
- Inventor: Yuji Watazu , Yosuke Shibata
- Applicant: Nissha Co., Ltd.
- Applicant Address: JP Kyoto-shi, Kyoto
- Assignee: NISSHA CO., LTD.
- Current Assignee: NISSHA CO., LTD.
- Current Assignee Address: JP Kyoto-shi, Kyoto
- Agency: United IP Counselors, LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7e746bfe
- Main IPC: G01L1/14
- IPC: G01L1/14 ; G01L5/165 ; G01L5/16

Abstract:
Each of a first electrode pattern Ty and a second electrode pattern Tx extends between third electrodes Rx neighboring in a Y direction among the plurality of third electrodes Rx so as to overlap only partly with each of the neighboring third electrodes Rx in a plan view. A microcontroller is configured to detect capacitance generated at those portions. The microcontroller is configured to calculate shear force based on a capacitance change obtained due to a change in an overlapping surface area between the third electrode Rx and the first electrode pattern Ty and the second electrode pattern Tx overlapping each other in a plan view, when a pressure is applied so that an insulator is deformed.
Public/Granted literature
- US20180356299A1 PRESSURE DETECTING DEVICE Public/Granted day:2018-12-13
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