Invention Grant
- Patent Title: Nitride based sensor
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Application No.: US16142671Application Date: 2018-09-26
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Publication No.: US10761049B2Publication Date: 2020-09-01
- Inventor: Adel Najar
- Applicant: UNITED ARAB EMIRATES UNIVERSITY
- Applicant Address: AE Al Ain
- Assignee: UNITED ARAB EMIRATES UNIVERSITY
- Current Assignee: UNITED ARAB EMIRATES UNIVERSITY
- Current Assignee Address: AE Al Ain
- Agency: Hayes Soloway PC
- Main IPC: G01N27/414
- IPC: G01N27/414 ; G01N33/00

Abstract:
The present invention discloses a nitride based sensor including a nitride based semiconductor, wherein a plurality of metal nanoparticles are attached to a surface of the nitride based semiconductor, and the surface of the nitride based semiconductor is passivated with at least one thiol compound. The present invention also provides a method of fabricating a nitride-based sensor. The present invention also discloses a porous gallium nitride (GaN) based H2 gas sensor, comprising a GaN based semiconductor with a plurality of Pt nanoparticles attached to a surface, wherein the GaN based semiconductor is passivated with a thiol compound, and wherein the sensor exhibits responsiveness of at least 60% for detection of H2 at a concentration of 30 ppm at room temperature.
Public/Granted literature
- US20200096473A1 NITRIDE BASED SENSOR Public/Granted day:2020-03-26
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