Invention Grant
- Patent Title: Generating a high-resolution lithology model for subsurface formation evaluation
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Application No.: US15883817Application Date: 2018-01-30
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Publication No.: US10761231B2Publication Date: 2020-09-01
- Inventor: Hao Zhang , Alberto Mezzatesta
- Applicant: Hao Zhang , Alberto Mezzatesta
- Applicant Address: US TX Houston
- Assignee: BAKER HUGHES, A GE COMPANY, LLC
- Current Assignee: BAKER HUGHES, A GE COMPANY, LLC
- Current Assignee Address: US TX Houston
- Agency: Cantor Colburn LLP
- Main IPC: G06F11/30
- IPC: G06F11/30 ; G01V1/30 ; E21B7/06 ; G01V1/50 ; C09K8/62 ; E21B49/00 ; G01V99/00 ; G01V1/28 ; G01V5/10 ; G01V3/08 ; E21B43/00 ; E21B44/00

Abstract:
Examples of techniques for generating a high-resolution lithology model for subsurface formation evaluation are disclosed. In one example implementation according to aspects of the present disclosure, a computer-implemented method includes determining, by a processing device, a low-resolution lithology volumetric model. The method further includes comparing, by the processing device, the low-resolution lithology volumetric model to a high-resolution imaging log. The method further includes calculating, by the processing device, a dynamic boundary curve for each of a plurality of moving windows. The method further includes generating, by the processing device, the high-resolution lithology model based at least in part on the calculated dynamic boundary curve for each of the plurality of moving windows. The method further includes controlling a drilling operation based at least in part on the high-resolution lithology model.
Public/Granted literature
- US20190235109A1 GENERATING A HIGH-RESOLUTION LITHOLOGY MODEL FOR SUBSURFACE FORMATION EVALUATION Public/Granted day:2019-08-01
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