Invention Grant
- Patent Title: Laser exposure head with reduced leakage
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Application No.: US16045864Application Date: 2018-07-26
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Publication No.: US10761399B2Publication Date: 2020-09-01
- Inventor: Valentine A. Karassiouk , Nissim Pilossof
- Applicant: Eastman Kodak Company
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent Kevin E. Spaulding
- Main IPC: G02F1/29
- IPC: G02F1/29 ; G02F1/03 ; G02F1/07 ; G02F1/315 ; B41J2/44 ; G02B5/00 ; G02B27/28

Abstract:
A laser exposure system includes an electrically-controlled diffraction grating which can be controlled to be in a first state where the incident light beam is undiffracted and a second state where the incident light beam is diffracted into a plurality of light beams including a zero-order light beam and first and second diffracted light beams. An aperture structure which passes the first and second diffracted light beams while blocking the zero-order light beam. A polarization rotator rotates a polarization state of the second diffracted light, and a polarization beam combiner combines the first diffracted light beam and the polarization-rotated second diffracted light beam onto a common path forming a combined light beam. An optical element focuses the combined light beam onto an imaging medium. A controller controls the state of the electrically-controlled diffraction grating in accordance with pixel data to form a printed image.
Public/Granted literature
- US20200033695A1 LASER EXPOSURE HEAD WITH REDUCED LEAKAGE Public/Granted day:2020-01-30
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