Invention Grant
- Patent Title: Pellicle film for photolithography and pellicle
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Application No.: US15991372Application Date: 2018-05-29
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Publication No.: US10761421B2Publication Date: 2020-09-01
- Inventor: Yu Yanase
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@573545cf
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64 ; G03F1/80 ; G03F7/20
Abstract:
A pellicle film for photolithography that is a pellicle film to be stretched over one end face of a pellicle frame, and is characterized by including a polymer film, and a gas impermeable layer formed on one side or both sides of the polymer film, and a pellicle for photolithography provided with the pellicle film.
Public/Granted literature
- US20180373140A1 PELLICLE FILM FOR PHOTOLITHOGRAPHY AND PELLICLE Public/Granted day:2018-12-27
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