Invention Grant
- Patent Title: Mask weak pattern recognition apparatus and mask weak pattern recognition method
-
Application No.: US16275480Application Date: 2019-02-14
-
Publication No.: US10762618B1Publication Date: 2020-09-01
- Inventor: Pin-Yen Tsai , Hsu-Tang Liu , Yi-Jung Chang , Chun-Liang Hou
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsinchu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, PC
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00

Abstract:
A mask weak pattern recognition apparatus and a mask weak pattern recognition method are provided. The mask weak pattern recognition apparatus includes a receiving unit, an overlapping unit, an analyzing unit and a training unit. The receiving unit is used for receiving a mask layout and an inspection image of a mask. The overlapping unit is used for overlapping the mask layout and the inspection image to obtain an overlapped image. The analyzing unit is used for obtaining a plurality of risk patterns and a plurality of risk scores each of which corresponds one of the risk patterns according to the overlapped image. The training unit is used for training a recognition model according to the risk patterns and the risk scores.
Public/Granted literature
- US20200265573A1 MASK WEAK PATTERN RECOGNITION APPARATUS AND MASK WEAK PATTERN RECOGNITION METHOD Public/Granted day:2020-08-20
Information query