Invention Grant
- Patent Title: Wastage determination method and plasma processing apparatus
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Application No.: US16472339Application Date: 2017-12-14
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Publication No.: US10763089B2Publication Date: 2020-09-01
- Inventor: Shu Kusano , Yusuke Hirayama
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@23e64f0
- International Application: PCT/JP2017/044933 WO 20171214
- International Announcement: WO2018/123621 WO 20180705
- Main IPC: H01J37/32
- IPC: H01J37/32 ; G01N15/06 ; B08B7/00

Abstract:
There is provision of a method of determining wastage including: processing a substrate using a plasma generated by multiple gases including fluorine gas; obtaining light emission intensity of each gas of the multiple gases including fluorine gas from the plasma, by an optical emission spectrometer (OES); and calculating a wastage rate of a particular expendable part from the obtained light emission intensity of each gas of the multiple gases including fluorine gas, with reference to a storage section storing a wastage rate of the particular expendable part in association with the light emission intensity of each gas of the multiple gases including fluorine gas.
Public/Granted literature
- US20190378698A1 WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS Public/Granted day:2019-12-12
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