Invention Grant
- Patent Title: Systems and methods for improved delamination characteristics in a semiconductor package
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Application No.: US15959658Application Date: 2018-04-23
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Publication No.: US10763130B2Publication Date: 2020-09-01
- Inventor: Taweesak Laevohan , Philbert Reyes , Jaggrit Vilairat , Sutee Thanaisawn , Janpen Phimphuang , Somsak Chunpangam
- Applicant: Microchip Technology Incorporated
- Applicant Address: US AZ Chandler
- Assignee: MICROCHIP TECHNOLOGY INCORPORATED
- Current Assignee: MICROCHIP TECHNOLOGY INCORPORATED
- Current Assignee Address: US AZ Chandler
- Agency: Slayden Grubert Beard PLLC
- Main IPC: H01L21/56
- IPC: H01L21/56 ; H01L23/495 ; H01L23/00 ; G01R31/28

Abstract:
Systems and methods are provided for producing an integrated circuit package, e.g., an SOIC package, having reduced or eliminated lead delamination caused by epoxy outgassing resulting from the die attach process in which an integrated circuit die is attached to a lead frame by an epoxy. The epoxy outgassing may be reduced by heating the epoxy during or otherwise in association with the die attach process, e.g. using a heating device provided at the die attach unit. Heating the epoxy may achieve additional cross-linking in the epoxy reaction, which may thereby reduce outgassing from the epoxy, which may in turn reduce or eliminate subsequent lead delamination. A heating device located at or near the die attach site may be used to heat the epoxy to a temperature of 55° C.±5° C. during or otherwise in association with the die attach process.
Public/Granted literature
- US20180308713A1 Systems And Methods For Improved Delamination Characteristics In A Semiconductor Package Public/Granted day:2018-10-25
Information query
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