Invention Grant
- Patent Title: Manufacturing method of color filter substrate
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Application No.: US15576820Application Date: 2017-11-08
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Publication No.: US10763458B2Publication Date: 2020-09-01
- Inventor: Wenjie Li
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD
- Current Assignee Address: CN Shenzhen, Guangdong
- Agency: Soroker Agmon Nordman
- International Application: PCT/CN2017/109837 WO 20171108
- International Announcement: WO2019/051968 WO 20190321
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01L51/56 ; H01L27/32 ; H01L51/52 ; G02B5/20 ; C23C14/06 ; G02B5/00

Abstract:
A manufacturing method of a color filter substrate is provided. The manufacturing method includes steps of providing a substrate comprising a color filter region and a black matrix region; depositing a black matrix layer on a surface of the substrate in the black matrix region; applying an RGB color resist to the color filter region of the substrate; correspondingly forming a plurality of photo spacers on a surface of the black matrix, the photo spacers being made from light-shielding material; forming a protective layer above the substrate. The photo spacers made from light-shielding material is arranged on the surface of the black matrix to prevent the transmission of light rays through the RGB color resist that results in mixture of colors.
Public/Granted literature
- US20190081282A1 MANUFACTURING METHOD OF COLOR FILTER SUBSTRATE Public/Granted day:2019-03-14
Information query
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