Invention Grant
- Patent Title: Work processing apparatus and method for manufacturing a processed work
-
Application No.: US16496919Application Date: 2018-03-23
-
Publication No.: US10766085B2Publication Date: 2020-09-08
- Inventor: Jun Matsuda , Tatsuo Okubo , Naoto Ozawa
- Applicant: ORIGIN COMPANY, LIMITED
- Applicant Address: JP Saitama-shi, Saitama
- Assignee: ORIGIN COMPANY, LIMITED
- Current Assignee: ORIGIN COMPANY, LIMITED
- Current Assignee Address: JP Saitama-shi, Saitama
- Agency: Squire Patton Boggs (US) LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@13cad87f
- International Application: PCT/JP2018/011727 WO 20180323
- International Announcement: WO2018/181000 WO 20181004
- Main IPC: B23K1/00
- IPC: B23K1/00 ; B23K1/008 ; B23K3/08 ; B23K31/02 ; F28D20/00

Abstract:
To provide a work processing apparatus equipped with a vaporizer that requires no carrier gas and can vaporize a vaporization target liquid having a relatively high flow rate, and a method for manufacturing a processed work. A vaporizer 1 includes a vaporization part 10 including a heat storage body 11 having a heat capacity higher than that of a vaporization target liquid Fq by a predetermined ratio, and a heat supplier 20 for supplying heat to the vaporization part 10. The predetermined ratio is a ratio of heat capacity at which a temperature drop of the heat storage body 11 by heat transfer from the heat storage body 11 to the liquid Fq flowing through a path 12 is within a predetermined range, wherein the amount of heat transferred from the heat storage body 11 to the liquid Fq is an amount of heat necessary to vaporize the liquid Fq at a planned proportion. A work processing apparatus 100 includes the vaporizer 1, a chamber 5, and a vacuum pump 6 for creating a negative pressure in the chamber 5. The method of manufacturing a processed work includes taking the work W into the chamber 5, supplying a processing gas Fg generated in the vaporizer 1 into the chamber 5, and performing predetermined processing on the work W under an atmosphere of the processing gas Fg in the chamber 5.
Public/Granted literature
- US20200122256A1 WORK PROCESSING APPARATUS AND METHOD FOR MANUFACTURING A PROCESSED WORK Public/Granted day:2020-04-23
Information query
IPC分类: