Invention Grant
- Patent Title: Method of manufacturing multilayer substrate
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Application No.: US16152824Application Date: 2018-10-05
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Publication No.: US10766238B2Publication Date: 2020-09-08
- Inventor: Yoshihito Takahashi , Daisuke Ito
- Applicant: DENSO CORPORATION
- Applicant Address: JP Kariya, Aichi-Pref.
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya, Aichi-Pref.
- Agency: Sughrue Mion, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3b33a10c
- Main IPC: B32B37/06
- IPC: B32B37/06 ; H05K3/46 ; B32B37/18 ; B32B27/08 ; B32B27/38

Abstract:
A method of manufacturing a multilayer substrate includes preparing a plurality of substrates, stacking the substrates with bonding sheets interposed, and a first bonding process of bonding the substrates to each other by partially heating the stacked substrates by a heater and partially melting the bonding sheet. Each of the substrates is provided with a through-hole and a metal film covering an inner peripheral surface of the through-hole. In the first bonding process, the metal film is heated by the heater and heat is transferred from the heater to the bonding sheet via the metal film.
Public/Granted literature
- US20190118520A1 METHOD OF MANUFACTURING MULTILAYER SUBSTRATE Public/Granted day:2019-04-25
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