Invention Grant
- Patent Title: Liquid ejection head substrate, method of manufacturing same and liquid ejection head
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Application No.: US16369287Application Date: 2019-03-29
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Publication No.: US10766256B2Publication Date: 2020-09-08
- Inventor: Soichiro Nagamochi , Yuzuru Ishida
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Venable LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@366820c1
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/16

Abstract:
Provided is a liquid ejection head substrate having a base, a heat generating resistor layer formed on or above the base and including an electrothermal conversion portion, a wiring electrically connected to the heat generating resistor layer and defining the electrothermal conversion portion and a protecting film covering at least the electrothermal conversion portion and the wiring of the heat generating resistor layer. In the liquid ejection head substrate, the wiring is made of an alloy containing Al as a main component and Cu and having an average crystal grain size of 300 nm or less.
Public/Granted literature
- US20190308416A1 LIQUID EJECTION HEAD SUBSTRATE, METHOD OF MANUFACTURING SAME AND LIQUID EJECTION HEAD Public/Granted day:2019-10-10
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