Invention Grant
- Patent Title: Sidewall stopper for MEMS device
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Application No.: US16392844Application Date: 2019-04-24
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Publication No.: US10766763B2Publication Date: 2020-09-08
- Inventor: Shih-Wei Lin , Chang-Ming Wu , Ting-Jung Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: B81B3/00
- IPC: B81B3/00 ; B81B1/00 ; B81C1/00

Abstract:
The present disclosure relates to a microphone. In some embodiments, the microphone may comprise a substrate, a diaphragm, a backplate, and a sidewall stopper. The substrate has an opening disposed through the substrate. The diaphragm is disposed over the substrate and facing the opening of the substrate. The diaphragm has a venting hole overlying the opening of the substrate. A backplate is disposed over and spaced apart from the diaphragm. A sidewall stopper is disposed along a sidewall of the venting hole of the diaphragm and thus is not limited by a distance between the movable part and the stable part. Also, the sidewall stopper does not alternate the shape of movable part, and thus will less likely introduce crack to the movable part. In some embodiments, the sidewall stopper may be formed like a sidewall stopper by a self-alignment process, such that no extra mask is needed.
Public/Granted literature
- US20200102209A1 SIDEWALL STOPPER FOR MEMS DEVICE Public/Granted day:2020-04-02
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