Invention Grant
- Patent Title: Resin and resist composition
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Application No.: US14604444Application Date: 2015-01-23
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Publication No.: US10766992B2Publication Date: 2020-09-08
- Inventor: Koji Ichikawa , Yusuke Fuji , Satoshi Yamaguchi
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@b220bf3 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@db712ab
- Main IPC: C08F224/00
- IPC: C08F224/00 ; C08F220/10 ; C08F228/06 ; G03F7/004 ; G03F7/039 ; C08F220/18 ; C08F222/14 ; G03F7/027 ; G03F7/038 ; C08F220/28 ; C08F226/06
Abstract:
A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined in the specification.
Public/Granted literature
- US20150132698A1 RESIN AND RESIST COMPOSITION Public/Granted day:2015-05-14
Information query
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