- Patent Title: System comprising a single wafer, reduced volume process chamber
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Application No.: US16225540Application Date: 2018-12-19
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Publication No.: US10770338B2Publication Date: 2020-09-08
- Inventor: Wieland Pethe , Dirk Noack
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/677 ; H01L21/324 ; H01L21/67
Abstract:
One illustrative system disclosed herein includes a process chamber positioned within a processing tool and a wafer chuck that is adapted to be positioned at a wafer processing position located within the process chamber and at a chuck wafer transfer position located outside of the process chamber.
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