Invention Grant
- Patent Title: Back side illuminated image sensor with deep trench isolation structures and self-aligned color filters
-
Application No.: US15785595Application Date: 2017-10-17
-
Publication No.: US10770501B2Publication Date: 2020-09-08
- Inventor: Kuo-Cheng Lee , Yun-Wei Cheng , Yung-Lung Hsu , Hsin-Chi Chen
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A semiconductor image sensor includes a substrate having a first side and a second side that is opposite the first side. An interconnect structure is disposed over the first side of the substrate. A plurality of radiation-sensing regions is located in the substrate. The radiation-sensing regions are configured to sense radiation that enters the substrate from the second side. A plurality of isolation structures are each disposed between two respective radiation-sensing regions. The isolation structures protrude out of the second side of the substrate.
Public/Granted literature
- US20180040661A1 BACK SIDE ILLUMINATED IMAGE SENSOR WITH DEEP TRENCH ISOLATION STRUCTURES AND SELF-ALIGNED COLOR FILTERS Public/Granted day:2018-02-08
Information query
IPC分类: