Invention Grant
- Patent Title: Liquid jet head and method for manufacturing liquid jet head
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Application No.: US16268270Application Date: 2019-02-05
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Publication No.: US10773517B2Publication Date: 2020-09-15
- Inventor: Shuichi Tanaka
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@401a01de
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/16 ; B41J2/14

Abstract:
Provided are a liquid jet head with which the size-reduction can be achieved, while the resistance of wiring formed on a wiring plate such as a sealing plate is lowered, and a method for manufacturing the liquid jet head. The liquid jet head includes: a sealing plate having a first surface to which a pressure chamber-forming plate including multiple piezoelectric elements is joined and a second surface which is on a side opposite from the first surface and to which a drive IC that outputs signals for driving the piezoelectric elements is joined, wherein a lower surface-side embedded wire connected to a common wire common to the driving elements are formed on the first surface of the sealing plate, and the lower surface-side embedded wire is at least partially embedded in the sealing plate.
Public/Granted literature
- US20190240974A1 LIQUID JET HEAD AND METHOD FOR MANUFACTURING LIQUID JET HEAD Public/Granted day:2019-08-08
Information query
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