Invention Grant
- Patent Title: Flow passage structure and processing apparatus
-
Application No.: US15757382Application Date: 2017-06-26
-
Publication No.: US10774420B2Publication Date: 2020-09-15
- Inventor: Takahiro Terada , Shiguma Kato , Shinya Higashi , Masayuki Tanaka , Takuya Matsuda
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5c4e521d
- International Application: PCT/JP2017/023442 WO 20170626
- International Announcement: WO2018/047440 WO 20180315
- Main IPC: C23C16/455
- IPC: C23C16/455 ; H01L21/67

Abstract:
According to an embodiment, a flow passage structure includes a member. The member has a surface and is provided with a first passage, a plurality of first openings, a second passage, and a plurality of second openings. The first passage includes a plurality of first closed path portions connected to each other. The first openings is connected to the first passage and is opened in the surface. The second passage includes a plurality of second closed path portions connected to each other. The second openings is connected to the second passage and is opened in the surface. The first closed path portions pass through the second closed path portions while being isolated from the second closed path portions. The second closed path portions pass through the first closed path portions while being isolated from the first closed path portions.
Public/Granted literature
- US20200232095A1 FLOW PASSAGE STRUCTURE AND PROCESSING APPARATUS Public/Granted day:2020-07-23
Information query
IPC分类: