Provided is a method of manufacturing a lattice-shaped laminated scintillator panel capable of enlarging the area and increasing the thickness with a means completely different from a conventional technique using a silicon wafer.A method of manufacturing a laminated scintillator panel having a structure in which a scintillator layer and a non-scintillator layer are repeatedly laminated in a direction substantially parallel to the direction of radiation incidence, the method including: a step of forming a laminate by repeatedly laminating the scintillator layer and the non-scintillator layer; and a joining step of pressurizing the laminate to join the scintillator layer and the non-scintillator layer integrally.