Invention Grant
- Patent Title: Method and system of revising a layout diagram
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Application No.: US16441802Application Date: 2019-06-14
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Publication No.: US10776551B2Publication Date: 2020-09-15
- Inventor: Meng-Kai Hsu , Sheng-Hsiung Chen , Wai-Kei Mak , Ting-Chi Wang , Yu-Hsiang Cheng , Ding-Wei Huang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G06F30/392
- IPC: G06F30/392 ; G06F30/398 ; G03F1/70 ; G06F111/04

Abstract:
A method (of generating a layout diagram) includes: identifying, in the layout diagram, a group of three or more cells which violates a horizontal constraint vector (HCV) and is arranged so as to exhibit two or more vertically-aligned edge-pairs (VEPs); each VEP including two members representing at least partial portions of vertical edges of corresponding cells of the group; relative to a horizontal direction, the members of each VEP being disposed in edgewise-abutment and separated by a corresponding actual gap; and the HCV having separation thresholds, each of which has a corresponding VEP and represents a corresponding minimum gap in the horizontal direction between the members of the corresponding VEP; and for each of at least one but fewer than all of the separation thresholds, selectively moving a given one of cells corresponding to one of the members of the corresponding VEP thereby to avoid violating the HCV.
Public/Granted literature
- US20200004912A1 METHOD AND SYSTEM OF REVISING A LAYOUT DIAGRAM Public/Granted day:2020-01-02
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