Invention Grant
- Patent Title: Defect inspection apparatus, defect inspection method, and non-transitory computer readable medium
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Application No.: US16129818Application Date: 2018-09-13
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Publication No.: US10776909B2Publication Date: 2020-09-15
- Inventor: Yasuyuki Ikeda , Masashi Kurita
- Applicant: OMRON Corporation
- Applicant Address: JP Kyoto
- Assignee: OMRON Corporation
- Current Assignee: OMRON Corporation
- Current Assignee Address: JP Kyoto
- Agency: JCIPRNET
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@188eafc2
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06K9/46

Abstract:
The disclosure includes: a memory section, storing a learned model and an internal parameter set in the learned model; an acquisition section, acquiring an image of an inspection object photographed under predetermined conditions; a preprocessing section, generating a predetermined preprocessing filter according to a feature value in a preprocessing image being an image of the inspection object that is acquired by the acquisition section and that includes a defect, and a feature value corresponding to the internal parameter, and generating a preprocessed image by applying the generated preprocessing filter to an inspection image being an image of the inspection object that is acquired by the acquisition section and converting the inspection image; and an inspection section, inspecting the preprocessed image for presence or absence of the defect of the inspection object by using the stored learned model.
Public/Granted literature
- US20190147586A1 DEFECT INSPECTION APPARATUS, DEFECT INSPECTION METHOD, AND PROGRAM THEREOF Public/Granted day:2019-05-16
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