Invention Grant
- Patent Title: Asymmetrical blocking bidirectional gallium nitride switch
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Application No.: US16428746Application Date: 2019-05-31
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Publication No.: US10777673B2Publication Date: 2020-09-15
- Inventor: David Sheridan
- Applicant: Alpha and Omega Semiconductor incorporated
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee Address: US CA Sunnyvale
- Agent Bo-In Lin
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/66 ; H01L29/40 ; H01L29/20 ; H01L29/205 ; H01L29/423 ; H01L29/49 ; H01L29/10

Abstract:
A high electron mobility transistor (HEMT) gallium nitride (GaN) bidirectional blocking device includes a hetero-junction structure comprises a first semiconductor layer interfacing a second semiconductor layer of two different band gaps thus generating an interface layer as a two-dimensional electron gas (2DEG) layer. The HEMT GaN bidirectional blocking device further includes a first source/drain electrode and a second source/drain electrode disposed on two opposite sides of a gate electrode disposed on top of said hetero-junction structure for controlling a current flow between the first and second source/drain electrodes in the 2DEG layer wherein the gate electrode is disposed at a first distance from the first source/drain electrode and a second distance from the second source/drain electrode and the first distance is different from the second distance.
Public/Granted literature
- US20190355844A1 ASYMMETRICAL BLOCKING BIDIRECTIONAL GALLIUM NITRIDE SWITCH Public/Granted day:2019-11-21
Information query
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