Invention Grant
- Patent Title: Liquid discharge apparatus and liquid discharge method
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Application No.: US16358165Application Date: 2019-03-19
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Publication No.: US10780718B2Publication Date: 2020-09-22
- Inventor: Aya Yamasawa , Manabu Arita , Toshihito Kamei , Shinichi Hatanaka
- Applicant: Aya Yamasawa , Manabu Arita , Toshihito Kamei , Shinichi Hatanaka
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@32f395db
- Main IPC: B41J11/00
- IPC: B41J11/00 ; B29C64/112 ; B29C64/393 ; B41J2/01 ; G01B11/30

Abstract:
A liquid discharge apparatus includes a liquid discharge device, circuitry, and a curing device. The liquid discharge device is configured to discharge a liquid having a curing degree variable by a stimulation amount while relatively moving to a recording medium. The circuitry is configured to acquire surface roughness information indicating glossiness of a formed object formed on the recording medium and set a stimulation amount for the liquid based on the surface roughness information. The curing device is configured to stimulate the liquid discharged by the liquid discharge device based on the stimulation amount set by the circuitry to cure the liquid. The circuitry is configured to set, based on the surface roughness information, the stimulation amount for each region stimulated by the curing device in a same plane of the formed object.
Public/Granted literature
- US20190299659A1 LIQUID DISCHARGE APPARATUS AND LIQUID DISCHARGE METHOD Public/Granted day:2019-10-03
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