Invention Grant
- Patent Title: Metal mask plate with planar structure and method for manufacturing the same
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Application No.: US15575774Application Date: 2017-04-01
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Publication No.: US10784443B2Publication Date: 2020-09-22
- Inventor: Shouhua Lv , Chun Chieh Huang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Applicant Address: CN Beijing CN Inner Mongolia
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing CN Inner Mongolia
- Agency: Dinsmore & Shohl LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@84ae279
- International Application: PCT/CN2017/079318 WO 20170401
- International Announcement: WO2017/215320 WO 20171221
- Main IPC: C23C14/02
- IPC: C23C14/02 ; H01L51/00 ; C23C14/24 ; C23C14/04 ; H01L51/56

Abstract:
A metal mask plate and a method for manufacturing the same are disclosed. A metal mask plate for evaporation comprises: a frame including a first side bar and a second side bar which are opposite and parallel to each other, and a support for supporting the first side bar and the second side bar; and a plurality of metal masks disposed on a first side of the frame, each of the metal masks extending in a direction which is perpendicular to a direction in which the first side bar extends, and both ends of each of the metal masks being fixed to the first side bar and the second side bar respectively, so that the support is deformed by a surface tension of the plurality of metal masks to form a planar structure.
Public/Granted literature
- US20180240976A1 METAL MASK PLATE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-08-23
Information query
IPC分类: