Invention Grant
- Patent Title: Fabricating method of QLED device and QLED device
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Application No.: US15745036Application Date: 2017-11-27
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Publication No.: US10784457B2Publication Date: 2020-09-22
- Inventor: Yuanchun Wu , Wei Yuan , Shibo Jiao , Zheng Xu
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: Hemisphere Law, PLLC
- Agent Zhigang Ma
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3e5211e7
- International Application: PCT/CN2017/113075 WO 20171127
- International Announcement: WO2019/080246 WO 20190502
- Main IPC: H01L51/50
- IPC: H01L51/50 ; H01L51/56

Abstract:
The disclosure provides a fabricating method of a QLED device and a QLED device. In the fabricating method of a QLED device, a mixed light-emitting layer is formed by doping a quantum dot material with a second hole transporting material having a valence band energy level between the quantum dot material and the first hole transporting material; a stepped barrier between the first hole transporting material and the doped second hole transporting material is used to enhance the hole injection; simultaneously, the first hole transporting material with a higher valence band energy level can block the electrons on one side of the hole transport layer close to the cathode to weaken the injection of electrons into the mixed light-emitting layer, thereby promoting the balance of carriers in the mixed light-emitting layer, improving the carrier recombination efficiency, and then improving the luminous efficiency and brightness of the QLED device.
Public/Granted literature
- US20190386233A1 FABRICATING METHOD OF QLED DEVICE AND QLED DEVICE Public/Granted day:2019-12-19
Information query
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