Invention Grant
- Patent Title: Substrate holder and plating apparatus using the same
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Application No.: US15645530Application Date: 2017-07-10
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Publication No.: US10793967B2Publication Date: 2020-10-06
- Inventor: Matsutaro Miyamoto
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: BakerHostetler
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@76751800
- Main IPC: C25D17/06
- IPC: C25D17/06 ; C25D7/12 ; C25D17/00 ; H01L21/687 ; H01L21/67

Abstract:
A substrate holder has a first holding member having a first surface configured to contact with a substrate, and a second holding member for sandwiching and holding the substrate together with the first holding member. The first holding member has a positioning member for positioning the substrate in contact with the first surface at a prescribed position of the first surface. The positioning member is configured to move between a first position where the substrate is to be positioned at the prescribed position of the first surface, in contact with a peripheral edge part of the substrate, and a second position not in contact with the substrate. The second holding member has a driving member configured to cause the positioning member to be positioned at the first position, at the time when holding the substrate by the first holding member and the second holding member.
Public/Granted literature
- US20180016698A1 SUBSTRATE HOLDER AND PLATING APPARATUS USING THE SAME Public/Granted day:2018-01-18
Information query