Invention Grant
- Patent Title: Shooting apparatus and focusing method
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Application No.: US15807557Application Date: 2017-11-08
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Publication No.: US10795115B2Publication Date: 2020-10-06
- Inventor: Satoshi Okawa , Takeshi Kindaichi , Naoaki Tani
- Applicant: Olympus Corporation
- Applicant Address: JP Tokyo
- Assignee: Olympus Corporation
- Current Assignee: Olympus Corporation
- Current Assignee Address: JP Tokyo
- Agency: Pokotylo Patent Services
- Agent John C. Pokotylo
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@66482cb
- Main IPC: G02B7/02
- IPC: G02B7/02 ; G02B7/10 ; G03B13/32 ; G03B3/10

Abstract:
A shooting apparatus comprising: a focusing lens provided within a lens barrel including a shooting lens, the focusing lens being movable in an optical axis direction; a ring disposed so as to be rotatable with respect to the lens barrel; a rotation detector configured to detect a rotation amount and rotation direction of the ring; a controller configured to calculate, based on the rotation amount detected by the rotation detector, a moving speed of the focusing lens to control a movement of the focusing lens at the calculated moving speed in a predetermined cycle period and in accordance with the rotation direction.
Public/Granted literature
- US20180129014A1 SHOOTING APPARATUS AND FOCUSING METHOD Public/Granted day:2018-05-10
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |