Invention Grant
- Patent Title: Integrated circuit layout generation method and system
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Application No.: US16294735Application Date: 2019-03-06
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Publication No.: US10796059B2Publication Date: 2020-10-06
- Inventor: Ke-Ying Su , Ke-Wei Su , Keng-Hua Kuo , Lester Chang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G06F30/30
- IPC: G06F30/30 ; G06F30/20 ; G06F30/392

Abstract:
A method of generating an integrated circuit (IC) layout diagram of an IC device includes receiving a layout diagram of the IC device, the IC layout diagram including a gate region having a width across an active region, and a gate via positioned at a location along the width. The location is used to divide the width into a plurality of width segments, an effective resistance of the gate region is calculated based on the plurality of width segments, and the effective resistance is used to determine whether the IC layout diagram complies with a design specification.
Public/Granted literature
- US20190294750A1 INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM Public/Granted day:2019-09-26
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