Invention Grant
- Patent Title: Standard cell design system, standard cell design optimization method thereof, and semiconductor design system
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Application No.: US16390087Application Date: 2019-04-22
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Publication No.: US10796068B2Publication Date: 2020-10-06
- Inventor: Uihui Kwon , Weiyi Qi , Yang Lu , Saetbyeol Ahn , Takeshi Okagaki
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@51fddfe
- Main IPC: G06F30/398
- IPC: G06F30/398 ; G06N20/00 ; G06F30/392 ; G06F119/18

Abstract:
A standard cell design system is provided. The standard cell design system includes at least one processor configured to implement: a control engine that determines planar parameters and vertical parameters of a target standard cell, a three-dimensional structure generating engine that generates a three-dimensional structure of the target standard cell based on the planar parameters and the vertical parameters, an extraction engine that extracts a standard cell model of the target standard cell from the three-dimensional structure, an assessment engine that performs a plurality of assessment operations based on the standard cell model, and an auto-optimizing engine that adjusts, based on a machine learning algorithm, the planar parameters and the vertical parameters based on results of the plurality of assessment operations.
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