Invention Grant
- Patent Title: Layout pattern similarity determination based on binary turning function signatures
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Application No.: US16515451Application Date: 2019-07-18
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Publication No.: US10796070B2Publication Date: 2020-10-06
- Inventor: Navin Srivastava , Hanzhong Xu , John Edward Hershberger
- Applicant: Mentor Graphics Corporation
- Applicant Address: US OR Wilsonville
- Assignee: Mentor Graphics Corporation
- Current Assignee: Mentor Graphics Corporation
- Current Assignee Address: US OR Wilsonville
- Main IPC: G06F30/00
- IPC: G06F30/00 ; G06F30/398 ; G06K9/62
Abstract:
One or more binary turning function signatures for each of the layout patterns are determined. The one or more binary turning function signatures comprise binary turning function signatures for polygons in each of the layout patterns, and may further comprise binary turning function signatures for secondary polygons A binary turning function signature of a polygon is derived based on deriving a minimum binary number or a maximum binary number among variants of a binary turning function sequence number for the polygon. The variants are generated by circular bit shifting and bit sequence reversing. Similar layout patterns in the layout patterns are determined based on the one or more binary turning function signatures.
Public/Granted literature
- US20200026820A1 Layout Pattern Similarity Determination Based On Binary Turning Function Signatures Public/Granted day:2020-01-23
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