Invention Grant
- Patent Title: Memory device and method of fabricating the same
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Application No.: US16547014Application Date: 2019-08-21
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Publication No.: US10796952B1Publication Date: 2020-10-06
- Inventor: Kuan-Yuan Shen
- Applicant: MACRONIX International Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: J.C. Patents
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L27/11582 ; H01L27/11578 ; H01L23/528 ; H01L27/11551 ; H01L27/11514

Abstract:
Provided is a memory device, including a stacked structure, a pillar, a first stop layer, and a contact plug. The stacked structure includes a plurality of conductive layers. The pillar penetrates the plurality of series-connected memory cells. The plurality of series-connected memory cells are located in a layout pattern of pillar locations at cross-points between the pillar and the conductive layers. The first stop layer covers the stacked structure and a portion of a top surface of the pillar. The contact plug passes through the first stop layer, extending into the pillar, and is electrically connected to the plurality of series-connected memory cells. The contact is landed on the contact plug, and is electrically connected to a portion of the pillar through the contact plug.
Information query
IPC分类: