Invention Grant
- Patent Title: Semiconductor structure and manufacturing method thereof
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Application No.: US16201187Application Date: 2018-11-27
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Publication No.: US10797007B2Publication Date: 2020-10-06
- Inventor: Hsiao-Wen Lee , Hsiu-Mei Yu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L23/00 ; H01L21/48 ; H01L21/683

Abstract:
The present disclosure provides a semiconductor structure including a first insulation, a second insulation over the first insulation, a third insulation over the second insulation, a first conductor proximal to a boundary between the first insulation and the second insulation, and an electronic device electrically connected to the first conductor and at least partially surrounded by the second insulation. A coefficient of thermal expansion (CTE) of the second insulation is larger than a CTE of the first insulation and larger than a CTE of the third insulation.
Public/Granted literature
- US20190164912A1 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-05-30
Information query
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