Invention Grant
- Patent Title: Electrostatic discharge protection device and method
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Application No.: US15659525Application Date: 2017-07-25
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Publication No.: US10797044B2Publication Date: 2020-10-06
- Inventor: Fei Zhou
- Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION , SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Applicant Address: CN Beijing CN Shanghai
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION,SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee Address: CN Beijing CN Shanghai
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@227c28ac
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/66 ; H01L29/861 ; H01L21/768 ; H01L23/535 ; H01L29/08 ; H01L29/10 ; H01L29/423 ; H01L29/78 ; H01L29/49

Abstract:
An electrostatic discharge (ESD) protection device includes a semiconductor substrate and a semiconductor fin located on the semiconductor substrate. The semiconductor fin includes a well region, a first doped region, and a second doped region. The first doped region and the second doped region are respectively adjacent to and being separated by a first portion of the well region. The device also includes a first gate structure on the semiconductor fin between the first doped region and the second doped region, and a first conductive structure electrically connecting the gate structure and the first doped region to a same potential. The ESD protection device can also have a third doped region and a second gate structure coupled to the same potential. The device also has a second conductive structure for connecting to a point between an external signal and a circuit to be protected.
Public/Granted literature
- US20180040605A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE AND METHOD Public/Granted day:2018-02-08
Information query
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