Invention Grant
- Patent Title: Multilayer graphene quantum carbon-based semiconductor material prepared from PI film, and preparation method therefor
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Application No.: US16282314Application Date: 2019-02-22
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Publication No.: US10797136B2Publication Date: 2020-10-06
- Inventor: Ping Liu
- Applicant: SHENZHEN DANBOND TECHNOLOGY CO., LTD
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: SHENZHEN DANBOND TECHNOLOGY CO., LTD
- Current Assignee: SHENZHEN DANBOND TECHNOLOGY CO., LTD
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Winston Hsu
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L21/324 ; H01L29/167 ; H01L29/12 ; C01B32/182 ; H01L29/267 ; H01L23/532

Abstract:
A preparation method for a multilayer graphene quantum carbon-based two-dimensional semiconductor material comprises: S1. taking a PI film as a raw material, and performing polymer sintering at a first temperature, to remove H, O and N atoms to form a carbon precursor; and S2. adjusting the temperature to a second temperature, and graphitizing the carbon precursor to form a multilayer graphene quantum carbon-based two-dimensional semiconductor material, wherein in at least the step S2, a nano metal material is doped to form quantum dots in the multilayer graphene. The multilayer graphene quantum carbon-based two-dimensional semiconductor material prepared by the method adopts a hexagonal planar net molecular structure, is orderly arranged, and has flexibility, high tortuosity, and quite low in-plane dispersity and degree of deviation. Band gaps are formed through doping of a nano metal, and the band gaps are controllable.
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