Invention Grant
- Patent Title: Multi-gate FinFET including negative capacitor, method of manufacturing the same, and electronic device
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Application No.: US16054809Application Date: 2018-08-03
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Publication No.: US10797178B2Publication Date: 2020-10-06
- Inventor: Huilong Zhu , Zhengyong Zhu
- Applicant: Institute of Microelectronics, Chinese Academy of Sciences
- Applicant Address: CN Beijing
- Assignee: Institute of Microelectronics Chinese Academy of Sciences
- Current Assignee: Institute of Microelectronics Chinese Academy of Sciences
- Current Assignee Address: CN Beijing
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@56650b9f
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/82 ; H01L21/8234 ; H01L27/12 ; H01L29/66 ; H01L21/84 ; H01L27/088 ; H01L29/10

Abstract:
There are provided a multi-gate FinFET including a negative capacitor connected to one of its gates, a method of manufacturing the same, and an electronic device comprising the same. The FinFET may include a fin extending in a first direction on a substrate, a first gate extending in a second direction crossing the first direction on the substrate on a first side of the fin to intersect the fin, a second gate opposite to the first gate and extending in the second direction on the substrate on a second side of the fin opposite to the first side to intersect the fin, a metallization stack provided on the substrate and above the fin and the first and second gates, and a negative capacitor formed in the metallization stack and connected to the second gate.
Public/Granted literature
- US20180342622A1 MULTI-GATE FINFET INCLUDING NEGATIVE CAPACITOR, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC DEVICE Public/Granted day:2018-11-29
Information query
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