Invention Grant
- Patent Title: Plasma source
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Application No.: US16480063Application Date: 2017-12-21
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Publication No.: US10798810B2Publication Date: 2020-10-06
- Inventor: Pascal Sortais
- Applicant: Polygon Physics
- Applicant Address: FR Meylan
- Assignee: Polygon Physics
- Current Assignee: Polygon Physics
- Current Assignee Address: FR Meylan
- Agency: The Noblitt Group, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1a3f4525
- International Application: PCT/FR2017/053798 WO 20171221
- International Announcement: WO2018/142036 WO 20180809
- Main IPC: H05H1/46
- IPC: H05H1/46 ; H01J27/16
Abstract:
The invention concerns a plasma source including a quarter wave antenna (204) located in a cylindrical enclosure (202) provided with an opening (208) opposite the end of the antenna (204). The diameter (d) of the antenna (204) is in the range from one third to one quarter of the inner diameter (d1) of the enclosure (202). The distance (l) between the end of the antenna (204) and the opening (208) is in the range from ⅔ to 5/3 of the diameter (d) of the antenna (204).
Public/Granted literature
- US20190394866A1 Plasma Source Public/Granted day:2019-12-26
Information query
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