Invention Grant
- Patent Title: Waveguide etch method for multi-layer optical devices
-
Application No.: US16424645Application Date: 2019-05-29
-
Publication No.: US10802218B2Publication Date: 2020-10-13
- Inventor: Thomas Wetteland Baehr-Jones , Ruizhi Shi
- Applicant: Elenion Technologies, LLC
- Applicant Address: US NY New York
- Assignee: Elenion Technologies, LLC
- Current Assignee: Elenion Technologies, LLC
- Current Assignee Address: US NY New York
- Agency: Stratford Managers Corporation
- Main IPC: G02B6/42
- IPC: G02B6/42 ; G02B6/136 ; G02B6/122 ; G02B6/12

Abstract:
An optical device and a method of manufacturing an optical device, including a ridge waveguide second, and a strip-loaded ridge waveguide section, comprises applying two different protective layers and two separate etches at two different depths. The protective layers overlap to protect the same section of the optical device, and to limit the surfaces of optical device to exposure to multiple etches, except at edges where the protective layers overlap.
Public/Granted literature
- US20190278024A1 WAVEGUIDE ETCH METHOD FOR MULTI-LAYER OPTICAL DEVICES Public/Granted day:2019-09-12
Information query