Invention Grant
- Patent Title: Film bulk acoustic wave resonator (FBAR) having stress-relief
-
Application No.: US15661468Application Date: 2017-07-27
-
Publication No.: US10804877B2Publication Date: 2020-10-13
- Inventor: Richard C. Ruby , Suresh Sridaran
- Applicant: Avago Technologies International Sales Pte. Limited
- Applicant Address: SG Singapore
- Assignee: Avago Technologies International Sales Pte. Limited
- Current Assignee: Avago Technologies International Sales Pte. Limited
- Current Assignee Address: SG Singapore
- Agency: Foley & Lardner LLP
- Main IPC: H03H9/17
- IPC: H03H9/17 ; H03H9/54 ; H03H9/13

Abstract:
An acoustic resonator structure comprises: a substrate comprising a cavity having a plurality of sides; a first electrode disposed over the cavity; a first connection portion that connects to the first electrode over only one side of the plurality of sides of the cavity; a piezoelectric layer disposed over at least a portion of the first electrode; a second electrode disposed over the piezoelectric layer; and a second connection portion that connects to the second electrode over only the one side of the plurality of sides. The second connection portion does not overlap the first connection portion, and a contacting overlap of the first electrode, the piezoelectric layer and the second electrode provides an active area of the acoustic resonator.
Public/Granted literature
- US20170338799A1 FILM BULK ACOUSTIC WAVE RESONATOR (FBAR) HAVING STRESS-RELIEF Public/Granted day:2017-11-23
Information query
IPC分类: