- Patent Title: Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition
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Application No.: US15925034Application Date: 2018-03-19
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Publication No.: US10808142B2Publication Date: 2020-10-20
- Inventor: Sangwon Kim , Minsu Seol , Hyeonjin Shin , Dongwook Lee , Yunseong Lee , Seongjun Jeong , Alum Jung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1177de8a
- Main IPC: H01L21/027
- IPC: H01L21/027 ; C09D165/00 ; G03F7/16 ; G03F7/20 ; G03F7/38 ; G03F7/32 ; H01L21/311 ; C01B32/184 ; G03F7/09 ; C01B32/182 ; C08G61/02 ; B82Y40/00 ; B82Y30/00
Abstract:
Provided are a method of preparing a graphene quantum dot, a graphene quantum dot prepared using the method, a hardmask composition including the graphene quantum dot, a method of forming a pattern using the hardmask composition, and a hardmask obtained from the hardmask composition. The method of preparing a graphene quantum dot includes reacting a graphene quantum dot composition and an including a polyaromatic hydrocarbon compound and an organic solvent at an atmospheric pressure and a temperature of about 250° C. The polyaromatic hydrocarbon compound may include at least four aromatic rings.
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