Invention Grant
- Patent Title: Resist composition and patterning process
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Application No.: US16251622Application Date: 2019-01-18
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Publication No.: US10809617B2Publication Date: 2020-10-20
- Inventor: Jun Hatakeyama , Masaki Ohashi
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westman, Hattori, Daniels & Adrian, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1df0b283
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C07C65/05 ; C07C309/65 ; G03F7/039 ; C07C57/58 ; C07C63/70 ; C07C65/03 ; C07C233/54 ; C07C271/28 ; C07C309/66 ; C07C381/12 ; C07D279/20 ; C07D327/08 ; C07D333/76 ; G03F7/004 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38
Abstract:
A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
Public/Granted literature
- US20190155155A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2019-05-23
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